High-Fidelity Modeling of Equipment Scale Processes in Semiconductor Manufacturing

Abstract: Rapid improvements in computing hardware, numerical

algorithms, and modern software engineering practices have revolu-

tionized the development of predictive simulation tools for a variety

of engineering systems. Such tools have had the greatest impact in

areas where the single physical or chemical processes need to be sim-

ulated. Examples being in aerodynamic flows, electromagnetics, and

structural mechanics, where model governing equations are well estab-

lished, and physical phenomena occurs over well-defined narrow range

of length and time scales. The most critical processes in semiconductor

manufacturing are unfortunately some of the most difficult phenomena to

 model and simulate. For example, etch/dep processing of single

wafer systems can involve flow, plasma, electromagnetic wave, gas- and

surface- chemistry, and heat-transfer phenomena occurring simultaneously; not to 

mention the increasingly important role of driving power supply circuits in the overall 

process control. This talk will provide an overview of some semiconductor 

manufacturing equipment simulation studies we have performed over the years. The 

role of computing hardware, algorithms, and hierarchical software engineering 

practices will be highlighted. Topics in the modeling and simulation of plasma

and non-plasma processing for semiconductor manufacture will be discussed.